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Evaluation and Application of 600 V GaN HEMT in Cascode Structure
395
Citations
25
References
2013
Year
Cascode StructureElectrical EngineeringExperimental ResultsEngineeringGan HemtPower DeviceRf SemiconductorNanoelectronicsAluminum Gallium NitridePower Semiconductor DeviceGan Power DeviceV Gan HemtPower ElectronicsCascode Gan HemtMicroelectronics
Gallium nitride high electron mobility transistor (GaN HEMT) has matured dramatically over the last few years. A progressively larger number of GaN devices have been manufactured for in field applications ranging from low power voltage regulators to high power infrastructure base-stations. Compared to the state-of-the-art silicon MOSFET, GaN HEMT has a much better figure of merit and shows potential for high-frequency applications. The first generation of 600 V GaN HEMT is intrinsically normally on device. To easily apply normally on GaN HEMT in circuit design, a low-voltage silicon MOSFET is in series to drive the GaN HEMT, which is well known as cascode structure. This paper studies the characteristics and operation principles of a 600 V cascode GaN HEMT. Evaluations of the cascode GaN HEMT performance based on buck converter at hard-switching and soft-switching conditions are presented in detail. Experimental results prove that the cascode GaN HEMT is superior to the silicon MOSFET, but it still needs soft-switching in high-frequency operation due to considerable package and layout parasitic inductors and capacitors. The cascode GaN HEMT is then applied to a 1 MHz 300 W 400 V/12 V LLC converter. A comparison of experimental results with a state-of-the-art silicon MOSFET is provided to validate the advantages of the GaN HEMT.
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