Determination of the Composition of Viscous Liquid Film on Electropolishing Copper Surface by XPS and AES

Abstract

XPS and AES was used to detect phosphorus on electropolished copper obtained using different hydroxyethylidenediphosphonic acid (HEDP) concentrations, different pH, and various solutions (, HEDP, and ). Since no phosphorus was detected on the copper surface, the viscous liquid film that formed could be easily eliminated by washing. The viscous liquid film obtained from the solution possesses very good film forming characteristics. The composition of viscous film was established from the constant composition region of the depth profile curve and is considered to be a polynuclear coordination polymeric compound with a structural unit approximately of .