Journal of The Electrochemical Society · 2006 · 131 citations · 16 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsAdhesive BondingChemical BondingChip PackagingSilicon MaterialsThin Film AdhesionWafer BondingBondingBonding Process OptimizationBonding Strength MeasurementBonding TechniquesDie-to-wafer BondingPlanarizationPlanarization TechniquesSilicon-on-insulator Technology
The process of bonding InP/InGaAsP dies to a processed silicon-on-insulator wafer using sub-300 nm layers of DVS-bisbenzocyclobutene BCB was developed. The planarization properties of these DVS-bis-BCB layers were measured and an optimal prebonding die preparation and polymer precure are presented. Bonding quality and bonding strength are assessed, showing high-quality bonding with sufficient bonding strength to survive postbonding processing.
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Bonding of silicon wafers for silicon-on-insulator
W. Maszara, Georges Goetz, A.L. Caviglia et al. · Journal of Applied Physics · 1988 · 861 citations
Frank Niklaus, Göran Stemme, Jian‐Qiang Lu et al. · Journal of Applied Physics · 2006 · 463 citations