Publication | Closed Access
Ion-implanted complementary MOS transistors in low-voltage circuits
335
Citations
3
References
1972
Year
Low-power ElectronicsElectrical EngineeringSemiconductor DeviceEngineeringNanoelectronicsBias Temperature InstabilityWeak Inversion RegionBoron Ion ImplantationPower Semiconductor DeviceComputer EngineeringMos Transistor OperationPower ElectronicsMicroelectronicsLow-voltage Circuits
Simple but reasonably accurate equations are derived which describe MOS transistor operation in the weak inversion region near turn-on. These equations are used to find the transfer characteristics of complementary MOS inverters. The smallest supply voltage at which these circuits will function is approximately 8kT/q. A boron ion implantation is used for adjusting MOST turn-on voltage for low-voltage circuits.
| Year | Citations | |
|---|---|---|
Page 1
Page 1