Stress migration and the mechanical properties of copper

Glenn Alers, J. Sukamto, Peter Woytowitz, Xiaoyu Lu, Sridhar K. Kailasam, Jon B. Reid

2005 · 25 citations · 6 references

Concepts

Abstract

Variations in the mechanical properties of copper related to plating chemistry and copper thickness are found to control stress migration performance in dual damascene copper interconnects. These observations cannot be explained by vacancy diffusion alone. Instead, the high tensile stress of the copper and elastic versus plastic energy dissipation needs to be considered to account for the degradation in stress migration.

References

6