Focused-Ion-Beam Processing for Photonics

Abstract

Although focused ion beam (FIB) processing is a well-developed technology for many applications in electronics and physics, it has found limited application to photonics. Due to its very high spatial resolution in the order of 10 nm, and its ability to mill almost any material, it seems to have a good potential for fabricating or modifying nanophotonic structures such as photonic crystals. The two main issues are FIB-induced optical loss, e.g., due to implantation of gallium ions, and the definition of vertical sidewalls, which is affected by redeposition effects. The severity of the loss problem was found to depend on the base material, silicon being rather sensitive to this effect. The optical loss can be significantly reduced by annealing the processed samples. Changing the scanning strategy for the ion beam can both reduce the impact of gallium implantation and the redeposition effect.