Observation of current‐density filamentation in multilayer structures by EBIC measurements

Abstract

Abstract The total current‐voltage characteristics of the p + ‐n + ‐p‐n − and n + ‐p‐n‐p − diodes under investigation show branches of negative differential resistance. Accompanied by the appearance of negative differential resistance is a filamentation of current‐density and electric‐field distribution. Electron beam‐induced current (EBIC) measurements were used to examine the properties of filamentation from the point of view of self‐organized pattern formation. Besides the detection of the spatial distribution of the electric field, EBIC measurements give information on current‐density filamentation. Furthermore, the perturbation by the electron beam gives information on the dynamic behavior of the filamentary structure.