Fabrication of Large Area, High‐Performance, Transparent Conducting Electrodes Using a Spontaneously Formed Crackle Network as Template

Abstract

A single micro/nanowire network of a metal deposited over a large area on a transparent substrate serves as a transparent conducting electrode with optoelectronic properties that are enhanced in many ways relative to the conventional indium tin oxide films. The wire surface is extremely smooth and the junctions are seamless, thanks to the crackle lithography process. The method is applicable to various metals and hybrid materials as well as to flexible and curved substrates. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.