Growth of A-15 Nb<inf>3</inf>Ge by co-evaporation

R. A. Sigsbee

IEEE Transactions on Magnetics · 1977 · 27 citations · 8 references

Concepts

Abstract

Enhanced T <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</inf> 's (>21°K), T <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">c</inf> widths and resistivity ratios result when controlled amounts of O <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> are admitted during film growth. O <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> levels ≈ 5 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-7</sup> mm Hg stabilize the Nb <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> Ge phase over a wide range of Nb/Ge flux ratios for films grown at 6A/sec and 1000°C.

References

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