MOCVD of MgAl2O4 thin films using new single molecular precursors: application of β-hydrogen elimination to the growth of heterometallic oxide films - Concepedia

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MOCVD of MgAl2O4 thin films using new single molecular precursors: application of β-hydrogen elimination to the growth of heterometallic oxide films

22

Citations

12

References

2001

Year

Jin‐Hyo Boo, S.-B. Lee, Su-Jin Ku, Won‐Gun Koh, Chongam Kim, K.‐S. Yu, Y. Kim

Applied Surface Science

Materials Scienceβ-Hydrogen EliminationEngineeringHeterometallic Oxide FilmsOxide ElectronicsChemistryThin FilmsMgal2o4 Thin FilmsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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