Solvent‐Vapor‐Induced Tunability of Self‐Assembled Block Copolymer Patterns

Abstract

Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching, SEM images reveal that the solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.