XPS analysis of poly[(3‐hydroxybutyric acid)‐<i>co</i>‐(3‐hydroxyvaleric acid)] film surfaces exposed to an allylamine low‐pressure plasma

Abstract

Abstract Homogeneous and stable layers were deposited through allylamine plasma polymerization (75 W, 100 Pa, 15 min) onto poly[(3‐hydroxybutyric acid)‐ co ‐(3‐hydroxyvaleric acid)] (91 : 9 wt.‐%) (P(HB‐ co ‐9%HV)) film surfaces, XPS analysis using take‐off angles of 20° and 70° and performed 10 days and 20 days after plasma treatment gives information on the composition (in atom%) of the modified surface: C, 62.74; N, 19.60; O, 17.65. The unexpected oxygen percentage is weaker if argon plasma pretreatment (25 W, 40 Pa, 5 min) is applied. Then, a succinct mechanism is proposed. The study of changes in element ratios and binding energy values shows that the majority of incorporated functional groups seem to be amide and imine groups.