Surface Roughness Effects in the Electrodeposition of Copper in the Limiting Current Range

Abstract

Copper was deposited at high mass transfer rates (rotating disk cathode) in the range of the limiting current of mass transfer. The roughness of the deposit was characterized by impedance measurements. Galvanostatic and potentiostatic experiments, in which the potential, or the current, was measured as a function of time, were also carried out. The various methods used show that a very rough deposit is formed when the limiting current is reached. The results are discussed from the viewpoint of the methodology of electrochemical determination of mass transfer coefficients and from that of the mechanism of metal powder formation at high current densities.