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Proton radiation damage in p-channel CCDs fabricated on high-resistivity silicon
57
Citations
9
References
2002
Year
Silicon Charge-coupled DevicesElectrical EngineeringEngineeringElectronic EngineeringBias Temperature InstabilityApplied PhysicsProton Radiation DamageRadiation DoseSilicon DebuggingSemiconductor Device FabricationP-channel BacksideSilicon On InsulatorMicroelectronicsOptoelectronicsPhotovoltaicsSemiconductor Device
P-channel backside illuminated silicon charge-coupled devices (CCDs) were developed and fabricated on high-resistivity n-type silicon. The devices have been exposed up to 1 /spl times/ 10/sup 11/ protons/cm/sup 2/ at 12 MeV. The charge transfer efficiency and dark current were measured as a function of radiation dose. These CCDs were found to be significantly more radiation tolerant than conventional n-channel devices. This could prove to be a major benefit for space missions of long duration.
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