A Two-Step Low-Temperature Process For A P-N Junction Formation Due To Hydrogen Enhanced Thermal Donor Formation In P-Type Czochralski Silicon - Concepedia

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A Two-Step Low-Temperature Process For A P-N Junction Formation Due To Hydrogen Enhanced Thermal Donor Formation In P-Type Czochralski Silicon

33

Citations

12

References

1998

Year

R. Job, W. R. Fahrner, N.M. Kazuchits, A. Ulyashin

MRS Proceedings

Materials ScienceTwo-step Low-temperature ProcessEngineeringNanoelectronicsApplied PhysicsP-type Czochralski SiliconSemiconductor MaterialChemistryHydrogenSilicon On Insulator

References

	Year	Citations

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