Dynamic scaling in a ballistic deposition model for a binary system

Abstract

A ballistic deposition model for the kinetics of surface growth for two species is introduced as a description of the evolution of a surface under vapor deposition. We used a tunable parameter P to control the deposition of the particles such that one type is deposited with probability P while the other is deposited with 1-P. Simulations in 2+1 dimensions using local surface diffusion lead to the formation of a rough surface whose dynamical evolution is not that of the Kardar-Parisi-Zhang universality class. Also, when surface diffusion becomes dominant, the model moves away from the Edwards-Wilkinson universality.