Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering - Concepedia

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Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering

110

Citations

55

References

2011

Year

Fang-Hsing Wang, Hung-Peng Chang, C.C. Tseng, Chia-Cheng Huang

Surface and Coatings Technology

Materials ScienceMaterials EngineeringAluminium NitrideEngineeringNanoelectronicsOxide ElectronicsSurface ScienceApplied PhysicsRf MagnetronThin FilmsAl Thin FilmsThin Film Processing

References

	Year	Citations

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