Focusing high energy X‐rays with stacked Fresnel zone plates

Abstract

Abstract Stacking technique was developed in order to increase focusing efficiency of Fresnel zone plates at high energies. Two identical Si chips each of which containing Fresnel zone plates were used for stacking. Alignment of the chips was achieved by on‐line observation of the moiré pattern from the two zone plates. The formation of moiré patterns was studied theoretically and experimentally at different experimental conditions. To provide the desired stability Si‐chips with zone plates were bonded together with slow solidification speed epoxy glue. Technique of angular alignment in order to compensate a linear displacement in the process of gluing was proposed. Two sets of stacked FZPs were produced and experimentally tested to focus 15 and 50 keV X‐rays. Gain in the efficiency by factor 2.5 was demonstrated at 15 keV. Focal spot of 1.8 μm vertically and 14 μm horizontally with 35% efficiency was measured at 50 keV. Forecast for the stacking of nanofocusing Fresnel zone plates was discussed. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)