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Lateral electron equilibrium and electron contamination in measurements of head‐scatter factors using miniphantoms and brass caps
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1995
Year
EngineeringElectron-beam LithographyElectron DiffractionMetal CapBeamstrahlungElectron OpticBeam OpticElectron MicroscopyElectron SpectroscopyOptical PropertiesBrass CapsComputational ElectromagneticsElectron ContaminationInstrumentationLateral Electron EquilibriumHead-scatter FactorPhysicsSynchrotron RadiationApplied PhysicsElectron MicroscopeSh ValuesOptoelectronicsBeam Transport System
The head-scatter factor (Sh) can be measured with a narrow miniphantom or a metal cap provided it is completely covered by the photon beam and its lateral size is thick enough to prevent electron contamination contributions. The effects of lateral electron equilibrium (LEE) and electron contamination on the Sh values were studied. The EGS4 Monte Carlo technique was used to calculate the minimum beam radii (rLEE) required to achieve complete LEE for photon beams ranging from 60Co to 24 MV. The measurement shows that the error introduced to the Sh value due to lateral electron disequilibrium is negligible. The radii of the miniphantoms or the sidewall thicknesses of the caps can be reduced below rLEE provided they are thick enough to prevent the effect of electron contamination.