Optical and Electrical Properties of SnO₂:F Thin Films Obtained by R.F. Sputtering With Various Targets

Abstract

Tin oxide films were deposited on glass substrates by reactive and non reactive r.f. sputtering using different types of targets corresponding to various Sn/F atomic ratio: hot pressed Sn–SnF 2 or SnO 2 –SnF 2 mixtures, ceramics obtained by casting either an aqueous SnO 2 –SnF 2 slurry or a suspension of tin oxide in molten tin fluoride. The samples were prepared in oxygen‐argon gas mixtures in which the oxygen concentration was varied from 0 mole % up to 30 mole% depending on the target. The optical and electrical properties of the obtained thin films have been studied and compared to those of the films obtained by spray technique.