Fabrication of three-dimensional photonic crystals by interference lithography with low light absorption

Abstract

Abstract We report on the fabrication of polymer templates of photonic crystals by means of holographic (or interference) lithography. The grating is written in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Keywords: photonic crystalinterference lithographyHe-Cd laserphotoresist SU-8 Acknowledgements This work was financially supported by the RFBR grant #07-02-12134-oфи, the RF Presidential grant HШ-3086.2008.9, and the Russian-American Program 'Basic Research and Higher Education' (BRHE, CRDF-project N RUXO-014-SA-06).