A Chemical Solution Approach to Epitaxial Metal Nitride Thin Films

Abstract

Epitaxial metal nitride films are prepared using a general chemical solution approach. A polymer-assisted deposition to prepare epitaxial cubic TiN, metastable AlN, and ternary nitride Ti1−xAlxN films is demonstrated. The structural, optical and electrical properties of the films are investigated, and may be of interest for many technological applications.