Conservation of flatband conditions for DySi2 monolayers on <i>n</i>-type Si(111)

Abstract

We propose a low-resistivity metal/Si/DySi2/Si multilayer Ohmic contact to n-type Si. For a DySi2 monolayer on n-type Si(111), the Fermi level has been found to be located only 0.08 eV below the conduction-band minimum of Si, corresponding to flatband conditions. Here, we demonstrate that this Fermi-level position is conserved to a large extent upon Si overgrowth of the monolayer, allowing us to exploit the flatband conditions for device applications under ambient conditions.