Epitaxial PbTiO3 thin films grown by organometallic chemical vapor deposition

Abstract

Epitaxial PbTiO3 layers have been grown on (001)SrTiO3 substrates by organometallic chemical vapor deposition using the precursors titanium-iso-propoxide and tetra-ethyl-lead. The growth temperature for these films was around 700 °C. The epitaxial nature of c-axis-oriented PbTiO3 is confirmed by Rutherford backscattering spectrometry, x-ray diffraction, including pole figure analysis, and high-resolution electron microscopy (HREM). With HREM twinning has been observed.