Publication | Closed Access

Electrical characterisation of Al/n–Si/p–Si Schottky junctions prepared by plasma immersion implantation

Semiconductor TechnologyElectrical EngineeringElectronic DevicesEngineeringIon ImplantationApplied PhysicsSemiconductor MaterialElectrical CharacterisationAl/n–si/p–si Schottky JunctionsSemiconductor DevicePlasma Immersion Implantation