Publication | Closed Access
Effects of spacer thickness on optical properties of stacked Ge/Si quantum dots grown by chemical vapor deposition
32
Citations
13
References
2003
Year
Optical MaterialsEngineeringOptoelectronic DevicesLuminescence PropertySemiconductor NanostructuresSemiconductorsElectronic DevicesPhotodetectorsOptical PropertiesQuantum DotsMolecular Beam EpitaxyCompound SemiconductorNanophotonicsMaterials SciencePhotoluminescenceNanotechnologySpacer ThicknessOptoelectronic MaterialsThinner Spacer LayerDifferent Spacer ThicknessesApplied PhysicsOptoelectronicsChemical Vapor Deposition
Photoluminescence investigations on stacked Ge/Si dots with different spacer thicknesses are presented. According to the emission energy shift in the Ge dots, we found that a thinner spacer layer will lead to remarkable Ge–Si intermixing during the stacking of the Ge/Si dots. Such material intermixing not only shallows the dot potential depth, but also softens the sharpness of the dot/spacer interface. In addition, the temperature of photoluminescence quenching also varies with the spacer thickness. Finally, we point out some important factors that are relevant to the room-temperature luminescence efficiency of stacked Ge/Si quantum dots.
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