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Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering

Materials ScienceElectrical EngineeringEngineeringOxide ElectronicsSurface ScienceApplied PhysicsD.c. Magnetron SputteringChemical DepositionMicroelectronicsElectrical PropertiesChemical Vapor DepositionThin Film ProcessingOxygen Partial Pressure