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Crossover from global to local rule for the Coulomb blockade in small tunnel junctions
47
Citations
4
References
1995
Year
Device ModelingElectrical EngineeringEngineeringTunneling MicroscopyPhysicsDouble JunctionCoulomb BlockadeApplied PhysicsCondensed Matter PhysicsQuantum MaterialsSmall Tunnel JunctionsHigh VoltagesMicroelectronicsLow VoltagesInterconnect (Integrated Circuits)Semiconductor DeviceLocal Rule
We have investigated several single and double aluminum tunnel junctions in the nonsuperconducting state. Current-voltage (I-V) characteristics were measured up to voltages corresponding to several hundred times e/C, where C is the capacitance of each junction. The individual junctions had capacitances in the order of 0.5 fF and resistances of 50--150 k\ensuremath{\Omega}. The offset voltage, defined as ${\mathit{V}}_{\mathrm{off}}$=V-I/(dI/dV), is resistance independent for given junction capacitances, but depends on the bias voltage. For a single junction the offset voltage is very small for low voltages, but it approaches the local-rule value of e/2C at high voltages. For a double junction the global rule applies at low voltages and the offset voltage equals ${\mathit{V}}_{\mathrm{off}}$=e/${\mathit{C}}_{\mathrm{\ensuremath{\Sigma}}}$, where ${\mathit{C}}_{\mathrm{\ensuremath{\Sigma}}}$=2C+${\mathit{C}}_{0}$. At large voltages the local rule applies and each junction contributes with a voltage of e/2C to the offset voltage, so that ${\mathit{V}}_{\mathrm{off}}$=e/C. This paper shows that a careful analysis of the offset voltage has to be made to determine the values of the capacitances involved.
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