Publication | Closed Access
Composition and chemical reactions of titanium oxide films deposited by laser evaporation
17
Citations
15
References
1991
Year
Optical MaterialsEngineeringTio2 TargetThin Film Process TechnologyChemistryChemical DepositionChemical EngineeringChemical ReactionsPulsed Laser DepositionTio2 TargetsThin Film ProcessingMaterials ScienceOptoelectronic MaterialsThin Film MaterialsLaser Processing TechnologyLaser-assisted DepositionAdvanced Laser ProcessingSurface ScienceApplied PhysicsMaterials CharacterizationTitanium Dioxide MaterialsLaser EvaporationThin FilmsChemical Vapor Deposition
Thin films were deposited on Pyrex glass substrates from Ti and TiO2 targets at room temperature by laser evaporation technique. These films were characterized by scanning electron microscopy, Auger electron spectroscopy, and depth profile analysis. The films deposited from Ti target are TiCx and TiOy matrix, while films from TiO2 target are almost stoichiometric in oxygen. The films have a smooth surface morphology under a laser power density of 5 × 106 W/cm2, which is close to the critical intensity for evaporation. The interface reaction of these films is strong, and the Ti atoms diffuse into the substrate.
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