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Tunneling escape rate of electrons from quantum well in double-barrier heterostructures
281
Citations
11
References
1987
Year
Semiconductor TechnologyQuantum ScienceEngineeringEnergy WidthPhysicsTunneling MicroscopyCoherence Versus IncoherenceQuantum DeviceApplied PhysicsCondensed Matter PhysicsQuantum MaterialsLaser ApplicationsMultilayer HeterostructuresDouble-barrier HeterostructuresTopological HeterostructuresTunneling Escape ProcessEscape Rate
A tunneling escape rate 1/${\mathrm{\ensuremath{\tau}}}_{\mathrm{T}}$ of electrons from a single quantum well through thin barriers was successfully determined by measurement and analysis of the lifetime ${\mathrm{\ensuremath{\tau}}}_{\mathrm{e}}$ of electrons generated in 6.2-nm GaAs single quantum wells by a picosecond laser pulse. The measured ${\mathrm{\ensuremath{\tau}}}_{\mathrm{e}}$ was found to decrease systematically as the AlAs barrier thickness ${\mathrm{L}}_{\mathrm{B}}$ was reduced. The ${\mathrm{\ensuremath{\tau}}}_{\mathrm{e}}$ for ${\mathrm{L}}_{\mathrm{B}}$4 nm was found to agree very well with the lifetime ${\mathrm{\ensuremath{\tau}}}_{\mathrm{T}}$ predicted from the energy width of the resonance transmission. Irrelevance of coherence versus incoherence in the tunneling escape process is also pointed out.
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