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Comparative Study on the Structural and Electrical Properties of Low-bftextitk SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Vapor Deposition

Materials ScienceElectrical EngineeringEngineeringSilicon On InsulatorSurface ScienceApplied PhysicsLow-bftextitk SiocThin FilmsChemical Vapor DepositionElectrical PropertiesComparative StudyPlasma ProcessingThin Film ProcessingElectrical Insulation