Publication | Open Access
Sub-THz radiation room temperature sensitivity of long-channel silicon field effect transistors
13
Citations
17
References
2012
Year
Abstract Room TemperatureThz PhotonicsElectrical EngineeringContact WiresEngineeringRf SemiconductorRadio FrequencyNoise Equivalent PowerElectronic EngineeringAntennaApplied PhysicsBias Temperature InstabilityMicrowave TransmissionTerahertz ScienceTerahertz TechniqueMicroelectronicsTerahertz PhotonicsOptoelectronics
Abstract Room temperature operating n-MOSFETs (n-type metal-oxide silicon field effect transistors) used for registration of sub-THz (sub-terahertz) radiation in the frequency range ν = 53−145 GHz are considered. n-MOSFETs were manufactured by 1-μm Si CMOS technology applied to epitaxial Si-layers (d ≈15 μm) deposited on thick Si substrates (d = 640 μm). It was shown that for transistors with the channel width to length ratio W/L = 20/3 μm without any special antennas used for radiation input, the noise equivalent power (NEP) for radiation frequency ν ≈76 GHz can reach NEP ∼6×10−10 W/Hz1/2. With estimated frequency dependent antenna effective area Sest for contact wires considered as antennas, the estimated possible noise equivalent power NEPpos for n-MOSFET structures themselves can be from ∼15 to ∼103 times better in the specral range of ν ∼55–78 GHz reaching NEPpos ≈10−12 W/Hz1/2.
| Year | Citations | |
|---|---|---|
Page 1
Page 1