Homogeneous Gas Phase Nucleation of Silane in Low Pressure Chemical Vapor Deposition (LPCVD) - Concepedia

Concepedia

Publication | Closed Access

Homogeneous Gas Phase Nucleation of Silane in Low Pressure Chemical Vapor Deposition (LPCVD)

32

Citations

0

References

1988

Year

Zhao Qian, H. Michiel, A. Van Ammel, J. Nijs, R. Mertens

Journal of The Electrochemical Society

EngineeringSurface ScienceApplied PhysicsNucleationChemistryChemical DepositionChemical KineticsChemical Vapor Deposition

No additional data available for this publication yet. Check back later!