A NEW APPROACH TO THE OBSERVATION OF THE RESIST IN X‐RAY CONTACT MICROSCOPY

Abstract

Abstract X‐ray microscopy is one of the useful applications of synchrotron radiation researches, and at present, X‐ray contact microscopy is the best developed method in this field. The images on the resist in X‐ray contact microscopy have been observed with a scanning electron microscope, and there have been some attempts to use the transmission electron microscope, but few have used the replica method. We have applied the replica method with plasma polymerization‐film to observe X‐ray images on the resist with a transmission electron microscope and found it to be applicable. A long exposure time is required when we use the monochromatic synchrotron radiation with a grasshopper monochromator. Our preliminary experiments with a new light source, undulator radiation, showed that it is very intense and useful for X‐ray contact microscopy.