Site-controlled InAs quantum dots grown on a 55 nm thick GaAs buffer layer

Abstract

We present site-controlled low density InAs quantum dots grown by molecular beam epitaxy with a template based overgrowth technique allowing enlarged buffer layers upto 55 nm. Growing a seeding layer of InAs quantum dots in etched holes reduces closing of the holes, so that a second layer of InAs quantum dots can be aligned to the holes after a buffer layer overgrowth. Confocal microphotoluminescence measurements show a significant decrease of the low temperature photoluminescence linewidth of the quantum dots to an average value of ∼500 μeV and a minimum width of 460 μeV. This is to be compared to 2 to 4 meV of quantum dots grown on thin buffer layers. This improvement is due to the enlarged distance to residual defects at the overgrown surface.