Developments in ionization assisted processes

Abstract

Recent developments in ionization assisted vapor deposition processes are traced, with special attention being given to PVD ceramic coating systems. The relative ionization performance of the various techniques is evaluated and shortcomings in terms of coating variability and control are identified; some solutions to these problems are suggested. To date, the systems outlined have been primarily exploited for titanium nitride deposition, and information is given on these coatings. Alternatives to that material are also discussed, indicating their potential advantages and research relevant to their deposition.