Wettability and Superhydrophilic TiO2 Film Formed by Chemical Vapor Deposition

Abstract

Abstract A superhydrophilic TiO2 film was prepared by CVD method. In this study, the thickness and roughness of TiO2 film were increased with the increase of oxygen fraction in the inlet flow. A rough surface of TiO2 film exhibited a better original wettability and photoinduced superhydrophilic rate than smooth one. The reasons for the original wettability and photoinduced super-hydrophilicity were explained by Wenzel’s law and the degree of crystallization.