Matrix‐Assisted Dip‐Pen Nanolithography and Polymer Pen Lithography

Abstract

The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape, and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer-pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size (see image). Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.