Publication | Closed Access
Heteroepitaxy of SrTiO3 on vicinal Si(001): Growth and kinetic effects
26
Citations
10
References
2004
Year
EngineeringChemistrySilicon On InsulatorSrtio3 FilmChemical EngineeringNanoelectronicsMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials EngineeringMaterials ScienceNanotechnologyOxide ElectronicsVicinal SiSurface ScienceApplied PhysicsSrtio3 FilmsThin FilmsChemical Vapor Deposition
Heteroepitaxy of SrTiO3 on vicinal Si(001) substrates was accomplished using molecular beam epitaxy by codepositing Sr and Ti at a low-temperature-and-low-oxygen-pressure condition at the early stage of film growth. X-ray photoelectron spectroscopy and reflection-high-energy-electron diffraction showed that the SrTiO3 films grown by this method exhibited better chemical and structural behaviors than those produced by layer-by-layer deposition under similar conditions. Scanning tunneling microscopy revealed that a well-defined step-terrace morphology was retained on the SrTiO3 film grown by codeposition on a vicinal Si(001) substrate. These results suggest that kinetic effects play an important role and the presence of Sr promotes titanium oxidation by providing a different transition state with a lower Ti oxidation barrier.
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