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Annealing of intrinsic stresses in sputtered TiN films: The role of thickness-dependent gradients of point defect density

Materials ScienceMaterials EngineeringEngineeringSurface ScienceApplied PhysicsSolid MechanicsDefect FormationPoint Defect DensityThin FilmsIntrinsic StressesEpitaxial GrowthSputtered Tin FilmsThin Film ProcessingMicrostructure