Process and equipment simulation of copper chemical vapor deposition using Cu(hfac)vtms

<i>The Properties of Gases and Liquids</i>

Robert C. Reid, T. K. Sherwood, Robert E. Street · Physics Today · 1959 · 14.2K citations

Natural Sciences, Chemistry, Physics +16

<i>Molecular Theory of Gases and Liquids</i>

Joseph O. Hirschfelder, C. F. Curtiss, R. Byron Bird · Physics Today · 1955 · 11.4K citations

Natural Sciences, Chemistry, Physics +14

Chemical Vapor Deposition of Copper from Hexafluoroacetylacetonato Copper(I) Vinyltrimethylsilane: Deposition Rates, Mechanism, Selectivity, Morphology, and Resistivity as a Function of Temperature and Pressure

Ajay K. Jain, K. ‐M., Toivo T. Kodas et al. · Journal of The Electrochemical Society · 1993 · 109 citations

Natural Sciences, Chemistry, Materials Science +16

A new metal-organic chemical vapor deposition process for selective copper metallization

John A. T. Norman, B.A. Muratore, Paul N. Dyer et al. · Materials Science and Engineering B · 1993 · 51 citations

Natural Sciences, Materials Engineering, Materials Science +8

The Processing Windows for Selective Copper Chemical Vapor Deposition from Cu(hexafluoroacetylacetonate)trimethylvinylsilane

Jung‐Chao Chiou, Kuen‐Chi Juang, Mao‐Chieh Chen · Journal of The Electrochemical Society · 1995 · 46 citations

Natural Sciences, Materials Engineering, Materials Science +16