Publication | Closed Access
Modified Stranski–Krastanov growth in stacked layers of self-assembled islands
165
Citations
14
References
1999
Year
Materials SciencePlanar GrowthModified Stranski–krastanov GrowthCritical ThicknessEngineeringMaterial AnalysisCrystalline DefectsPhysicsCrystal Growth TechnologySelf-assemblySurface ScienceApplied PhysicsSpacer Layer TsThin FilmsEpitaxial GrowthSemiconductor Nanostructures
In a stack of vertically aligned Stranski–Krastanov grown islands, the critical thickness for planar growth for all but the initial dot layer is reduced, if the thickness of the spacer layer ts is smaller than a certain value t0. We present structural and photoluminescence results on the basis of the extensively studied lattice-mismatched material system Si/Ge.
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