Publication | Closed Access
High-pressure condition of SiH4+Ar+H2 plasma for deposition of hydrogenated nanocrystalline silicon film
21
Citations
36
References
2008
Year
Materials ScienceHigh-pressure ConditionSih4+ar+h2 PlasmaEngineeringSurface ScienceApplied PhysicsSemiconductor Device FabricationHydrogenChemical Vapor DepositionPlasma ProcessingSilicon On Insulator
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