Journal of Materials Chemistry · 2002 · 232 citations · 9 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySurface ChemistryThin FilmsChemical Vapor DepositionCoatingsGlass MaterialsSurface PhysicsThin-film DepositionThin-film MaterialsAtmospheric PressureAtmospheric Pressure Chemical Vapor DepositionRaman MicroscopyReflectance SpectroscopyRutile OxidesSubstrate Temperature EffectsTransmittance SpectroscopyX-ray Diffraction Analysis
Thin films of the vanadium oxides, V2O5, VO2, VOx (x = 2.00–2.50) and V6O13 were prepared on glass substrates by atmospheric pressure chemical vapour deposition (APCVD) of vanadium tetrachloride and water at 400–550 °C. The specific phase deposited was found to be dependent on the substrate temperature and the reagent concentrations. The films were characterised by Raman microscopy, X-ray diffraction (XRD), Rutherford backscattering (RBS), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDX), reflectance/transmittance and UV absorption spectroscopy. The VO2 films show by Raman microscopy and reflectance/transmittance spectroscopy, reversible switching behaviour at 68 °C associated with a phase change from monoclinic (MoO2 structure) to tetragonal (TiO2, rutile structure).
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