Effect of temperature on the Hurst and growth exponents of CdTe polycrystalline films

Abstract

We have studied the influence of substrate temperature on the Hurst and growth exponents of CdTe thin films grown on glass substrates covered by fluorine doped tin oxide. The sample roughness profile was measured with a stylus profiler at different growth times and substrate temperatures in order to determine the critical exponents. The Hurst exponent increases linearly from 0.72 to 0.8, whereas the growth exponent increases exponentially from 0.14 to 0.62, for temperatures between 150 and 300°C. The global roughness also increases with growth temperature, which turns to be a very good parameter for roughness control.