<title>Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits</title>

Abstract

The principles and techniques of writing various types of micro gratings directly on chalcogenide (As2S3) film waveguides using the electron beam are reviewed. A computer-controlled apparatus has been developed so that we can fabricate any gratings of uniform/ chirped periods with slant lines which have the area of the order of 1 mm2, the diffraction efficiency of nearly 100 %, and the minimum grating period of 0.2 µm. Combination of those micro gratings results in integrated grating circuits (IGC). An IGC for guided-beam multiple division has been successfully fabricated.