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Deactivation of O<sub>2</sub>(<i>A</i><sup>3</sup>Σ) by O<sub>2</sub>, O, and Ar
71
Citations
17
References
1980
Year
Excited State PropertyEngineeringGlow DischargeApplied PhysicsAbstract O 2Atomic PhysicsPhysical ChemistryTime ComplexityChemistryGas Discharge PlasmaNickel SurfaceElectronic Excited StateIon EmissionChemical KineticsO 2
Abstract O 2 in the A 3 Σ u + state has been prepared in a discharge flow system by recombining oxygen atoms on a nickel surface. The decay of this excited state was followed by observing the emission between 280 and 400 nm. The wall deactivation was observed to approach unit efficiency. Rate constants were determined to be 0.9 × 10 −11 , 2.9 × 10 −13 , and 8.6 × 10 −16 cm 3 /molecule sec for the quenching of O 2 ( A 3 Σ u + ) by O, O 2 , and Ar, respectively.
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