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Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate

Materials ScienceEngineeringHydrogen-terminated Si SubstrateOxidant SourceOxide ElectronicsSurface ScienceOxidation ResistanceHydrogenChemistryChemical DepositionAtomic LayerChemical Vapor DepositionSilicon On Insulator