Applied Physics Letters · 1989 · 10 citations · 9 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsElectronic MaterialsSemiconductor MaterialsElectron DiffractionEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsAntimonide SemiconductorsAtomic Layer EpitaxyEpitaxial Film GrowthEpitaxial MaterialsReflection High-energy Electron DiffractionScanning Transmission Electron MicroscopyTransmission Electron Diffraction
Indium antimonide has been epitaxially grown directly on sapphire. Reflection high-energy electron diffraction, transmission electron microscopy, and scanning electron microscopy data are presented to show that the indium antimonide layer is epitaxial, has an abrupt interface with the sapphire, and grows in the 〈111〉 direction. Mobility data show room-temperature mobilities as high as 1×104 cm2 /V s from some regions on the wafer.
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Semiconducting III–V Compounds
C. Hilshum, Arthur Rose-Innes, Leonard R. Weisberg · Journal of The Electrochemical Society · 1963 · 228 citations
Growth of InSb and InAs1−<i>x</i>Sb<i>x</i> on GaAs by molecular beam epitaxy
J.‐I. Chyi, Ş. Kalem, N. S. Kumar et al. · Applied Physics Letters · 1988 · 110 citations
Growth of CdTe films on sapphire by molecular beam epitaxy
T. H. Myers, Y. C. Lo, R. N. Bicknell et al. · Applied Physics Letters · 1983 · 84 citations
Natural Sciences, Materials Engineering, Materials Science +17