Aerosol‐Assisted Formation of Mesostructured Thin Films

Abstract

A new aerosol‐assisted surfactant self‐assembly approach has been developed for large‐scale mesostructured silica thin film fabrication. The formation mechanism involves coalescence of semisolid surfactant–silica mesostructured particles on substrates (see Figure) and subsequent reassembly of the mesostructures to adapt the morphology transformation from spherical to planar shape.